Archiu:Ion implanter schematic.png
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Summary
| DescriptionIon implanter schematic.png |
English: Schematics of an mass separating implantation/deposition setup. Ion energy at the substrate is determined by the difference of Uaccell and Udecell. Image created using Tgif. |
| Date | |
| Source | Own work |
| Author | Daniel Schwen |
| Other versions |
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This image (or all images in this category) uses inside labels or attached captions in a specific script or language and should be converted to a language neutral form. This would allow its use in all Wikimedia projects and, more importantly, all Wikimedia languages.
беларуская (тарашкевіца) ∙ català ∙ čeština ∙ Deutsch ∙ English ∙ español ∙ فارسی ∙ suomi ∙ français ∙ magyar ∙ italiano ∙ 日本語 ∙ 한국어 ∙ македонски ∙ Bahasa Melayu ∙ Plattdüütsch ∙ Nederlands ∙ português ∙ русский ∙ sicilianu ∙ slovenčina ∙ slovenščina ∙ српски / srpski ∙ 中文 ∙ 中文(简体) ∙ +/− |
Licensing
| Permission is granted to copy, distribute and/or modify this document under the terms of the GNU Free Documentation License, Version 1.2 or any later version published by the Free Software Foundation; with no Invariant Sections, no Front-Cover Texts, and no Back-Cover Texts. A copy of the license is included in the section entitled GNU Free Documentation License.http://www.gnu.org/copyleft/fdl.htmlGFDLGNU Free Documentation Licensetruetrue |
| This file is licensed under the Creative Commons Attribution-Share Alike 3.0 Unported license. | ||
| ||
| This licensing tag was added to this file as part of the GFDL licensing update.http://creativecommons.org/licenses/by-sa/3.0/CC BY-SA 3.0Creative Commons Attribution-Share Alike 3.0truetrue |
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inception English
3 July 2005
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| Data/Hora | Miniatura | Dimensions | Usuari | Descripció | |
|---|---|---|---|---|---|
| actual | 13:56 14 ago 2026 | Sense miniatura | 1000 × 1000 (98 kB) | wikimediacommons>Wikimedia Commons |
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